Striving for Perfection - MEMS Sensors Based on Wafer Chip Fabrication Process Technology

Authors

  • Xiaohan Yin
  • Kang Shuai
  • Chunxiu Su

DOI:

https://doi.org/10.54691/7yd8n579

Keywords:

Mechanical engineering; MEMS; Micro-Electro-Mechanical Systems; Etching Process.

Abstract

To promote independent technological advancement in chips and break through the technical blockade faced by China's sensor industry, this work has developed a novel process. This process utilizes the solid porous 3D microstructure of Broussonetia papyrifera to achieve microscale thermal isolation, while proposing the use of thin-film layered structures of Broussonetia papyrifera to optimize and improve existing thermal MEMS devices. Breakthroughs in process preparation technology enable the production of precision MEMS sensors. Currently, this product achieves a micron-level process grade and supports wafer fabrication in both 8-inch and 10-inch sizes. Under the same 10-inch standard scale, the unit batch yield reaches 98.76%, with up to 576 sensor chips per single wafer, representing industry-leading performance. Due to these characteristics, the product has been widely applied in smart vehicles, intelligent healthcare, electronic resonance sensors, and other fields.

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Published

22-09-2025

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